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日期:2024-08-05
感應耦合電漿離子蝕刻技術 (I) Inductively Coupled Plasma Reactive Ion Etch (I) 簡介 本中心的感應耦合電漿離子蝕刻製程技術,主要是利用電漿來進行蝕刻,具有較佳的非等向性蝕刻。感應耦合電漿離子蝕刻 (ICP) 為目前矽深蝕刻最主要的技術之一,高深寬比蝕刻製 ......
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日期:2024-08-05
面,則使用電漿來清潔及改變材料表面以達到特殊的. 功能及效果。在環保方面,電漿
... 感應機制與與變壓器原理相同,其中線圈為變壓器之. 一次側(primary),而電漿則 ......
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日期:2024-08-01
儀器中文名稱:感應耦合電漿質譜分析儀 儀器英文名稱:INDUCTIVELY COUPLED PLASMA-MASS SPECTROMETER 儀器英文簡稱:ICP-MS 申請服務請從 科技部/ ......
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日期:2024-08-05
Inductively coupled plasma mass spectrometry (ICP-MS) is a type of mass spectrometry which is capable of detecting metals and several non-metals at ......
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日期:2024-08-04
感應耦合電漿原子發射光譜分析儀. INDUCTIVELY COUPLED PLASMA - ATOMIC EMISSION SPECTROMETER. 儀器中文名稱:感應耦合電漿原子發射光譜分析儀...
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日期:2024-08-06
Inductively coupled plasma atomic emission spectroscopy (ICP-AES), also referred to as inductively coupled plasma optical emission spectrometry (ICP-OES), ......
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日期:2024-08-06
An inductively coupled plasma (ICP) is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic ......
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日期:2024-08-05
An inductively coupled plasma ( ICP) is a type of plasma source in which the energy is supplied by electr ......