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![Patent US20120108066 - Pecvd showerhead configuration for cmp ...](https://www.iarticlesnet.com/pub/img/site/s_47.jpeg)
Patent US20120108066 - Pecvd showerhead configuration for cmp ...
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日期:2024-08-24
2012年5月3日 - A dielectric deposition tool for forming a silicon dioxide layer on a wafer with a TEOS showerhead which delivers a flow rate per unit area from ......看更多