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Extreme ultraviolet lithography - Wikipedia, the free encyclopedia
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日期：2024-07-11
Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being targeted for use at the 7 nm post-silicon node ...看更多
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